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Study of defects in implanted GaAs - te by cathodoluminescence

dc.contributor.authorMéndez Martín, María Bianchi
dc.contributor.authorPiqueras De Noriega, Francisco Javier
dc.contributor.authorCavallini, A.
dc.contributor.authorFraboni, B.
dc.date.accessioned2023-06-20T18:56:34Z
dc.date.available2023-06-20T18:56:34Z
dc.date.issued1994-05
dc.description© Elsevier Science SA Lausanne. International Workshop on Beam Injection Assessment of Defects in Semiconductors (BIADS 93) - A NATO Advanced Research Workshop (3. 1993. Bolonia, Italia)
dc.description.abstractEvidence for IR cathodoluminescence (CL) at 1.2 and 1.0 eV in Te-doped GaAs in the temperature range 80-300 K has been obtained. The evolution of CL intensity and half-width of emission bands after silicon implantation and annealing has been investigated. The increase in the CL intensity with implantation dose after heat treatment supports the association of Si and/or Te with the radiation-induced Ga vacancies to form Si(Ga) or Te(Ga) defects.
dc.description.departmentDepto. de Física de Materiales
dc.description.facultyFac. de Ciencias Físicas
dc.description.refereedTRUE
dc.description.statuspub
dc.eprint.idhttps://eprints.ucm.es/id/eprint/24925
dc.identifier.doi10.1016/0921-5107(94)90315-8
dc.identifier.issn0921-5107
dc.identifier.officialurlhttp://dx.doi.org/10.1016/0921-5107(94)90315-8
dc.identifier.relatedurlhttp://www.sciencedirect.com
dc.identifier.urihttps://hdl.handle.net/20.500.14352/58969
dc.issue.number1-mar
dc.journal.titleMaterials Science and Engineering B-Solid State Materials for Advanced Technology
dc.page.final140
dc.page.initial138
dc.publisherElsevier Science SA Lausanne
dc.rights.accessRightsmetadata only access
dc.subject.cdu538.9
dc.subject.keywordMaterials Science
dc.subject.keywordMultidisciplinary
dc.subject.keywordPhysics
dc.subject.keywordCondensed Matter
dc.subject.ucmFísica de materiales
dc.titleStudy of defects in implanted GaAs - te by cathodoluminescence
dc.typejournal article
dc.volume.number24
dspace.entity.typePublication
relation.isAuthorOfPublication465cfd5b-6dd4-4a48-a6e3-160df06f7046
relation.isAuthorOfPublication68dabfe9-5aec-4207-bf8a-0851f2e37e2c
relation.isAuthorOfPublication.latestForDiscovery465cfd5b-6dd4-4a48-a6e3-160df06f7046

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