Aviso: para depositar documentos, por favor, inicia sesión e identifícate con tu cuenta de correo institucional de la UCM con el botón MI CUENTA UCM. No emplees la opción AUTENTICACIÓN CON CONTRASEÑA
 

Depletion of ARGs in antibiotic-resistance Klebsiella, Pseudomonas and Staphylococcus in hospital urines by electro and photo-electro disinfection

dc.contributor.authorHerraiz Carboné, Miguel
dc.contributor.authorCotillas Soriano, Salvador
dc.contributor.authorLacasa, Engracia
dc.contributor.authorCañizares, Pablo
dc.contributor.authorRodrigo, Manuel A.
dc.contributor.authorSáez, Cristina
dc.date.accessioned2023-06-22T10:55:56Z
dc.date.available2023-06-22T10:55:56Z
dc.date.issued2022-08-05
dc.descriptionCRUE-CSIC (Acuerdos Transformativos 2022)
dc.description.abstractThe depletion of blaKPC (K. pneumoniae), blaOXA-50 (P. aeruginosa) and mecA (S. aureus) genes from hospital urines is evaluated to contribute to solve the silent pandemic of antibiotic-resistance bacteria. A microfluidic flowthrough reactor with MMO anode and CB/PTFE cathode working at 50 A m− 2 is employed during electrodisinfection and photo-electrodisinfection processes. The electrodisinfection process only achieves an almost negligible removal of DNA and slightly log ARG increments of 0.18, 0.19 and 0.71 for blaOXA-50, mecA and blaKPC genes, respectively. Conversely, the photo-electrodisinfection process attains the complete disinfection for all ARB tested and logarithmic removals of 3.70, 2.25 and 0.82 for blaOXA-50, mecA and blaKPC genes, respectively. These outcomes emphasize the potential of the UV light coupled to the electrodisinfection process to promote the formation of not only hypochlorite but also chlorine and even nitrogen radicals, which contribute to enhance the disinfection efficiency of the target ARB and their ARGs.
dc.description.departmentDepto. de Ingeniería Química y de Materiales
dc.description.facultyFac. de Ciencias Químicas
dc.description.refereedTRUE
dc.description.sponsorshipMinisterio de Ciencia e Innovación (MICINN)
dc.description.statuspub
dc.eprint.idhttps://eprints.ucm.es/id/eprint/74181
dc.identifier.doi10.1016/j.jwpe.2022.103035
dc.identifier.issn2214-7144
dc.identifier.officialurlhttps://doi.org/10.1016/j.jwpe.2022.103035
dc.identifier.urihttps://hdl.handle.net/20.500.14352/71904
dc.journal.titleJournal of Water Process Engineering
dc.language.isoeng
dc.page.initial103035
dc.publisherElsevier
dc.relation.projectIDPID2019-110904RB-I00
dc.rightsAtribución 3.0 España
dc.rights.accessRightsopen access
dc.rights.urihttps://creativecommons.org/licenses/by/3.0/es/
dc.subject.keywordAntibiotic-resistant bacteria
dc.subject.keywordAntibiotic resistance genes
dc.subject.keywordUrine
dc.subject.keywordElectrodisinfection
dc.subject.keywordPhoto-electrodisinfection
dc.subject.ucmIngeniería química
dc.subject.unesco3303 Ingeniería y Tecnología Químicas
dc.titleDepletion of ARGs in antibiotic-resistance Klebsiella, Pseudomonas and Staphylococcus in hospital urines by electro and photo-electro disinfection
dc.typejournal article
dc.volume.number49
dspace.entity.typePublication
relation.isAuthorOfPublication77a80497-c8c5-48bc-af68-460c8997f6b3
relation.isAuthorOfPublicationed898263-c6e6-435b-b688-e2b115651b2b
relation.isAuthorOfPublication.latestForDiscoveryed898263-c6e6-435b-b688-e2b115651b2b

Download

Original bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
1-s2.0-S2214714422004792-main.pdf
Size:
2.44 MB
Format:
Adobe Portable Document Format

Collections