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Electrical characterization of nanocrystalline Si films by scanning tunnelling spectroscopy and beam-induced current in the scanning tunnelling microscope

dc.contributor.authorNogales Díaz, Emilio
dc.contributor.authorMéndez Martín, María Bianchi
dc.contributor.authorPiqueras De Noriega, Francisco Javier
dc.contributor.authorPlugaru, R
dc.date.accessioned2023-06-20T10:40:41Z
dc.date.available2023-06-20T10:40:41Z
dc.date.issued2003-01
dc.description© 2003 IOP Publishing Ltd. This work has been supported by MCYT (Project MAT 2000-2119). RP acknowledges MECD for the research grant SB2000-0164.
dc.description.abstractNanocrystalline silicon films, with an average nanocrystal size of about 10 nm, obtained by boron implantation of amorphous silicon layers, have been studied by remote-beam-induced current (REBIC) in a scanning tunnelling microscope (STM) and by current imaging tunnelling spectroscopy. STM images reveal a cell structure with cell sizes of about 200 nm. STM-REBIC images display space-charge regions associated with the cell boundaries. The STM-REBIC contrast has been found to depend on the implantation dose and the thermal treatment given to the sample. The results show the capability of STM-REBIC to image electrically active regions in nanocrystalline silicon films with a resolution of up to 10 nm.
dc.description.departmentDepto. de Física de Materiales
dc.description.facultyFac. de Ciencias Físicas
dc.description.refereedTRUE
dc.description.sponsorshipMCYT
dc.description.sponsorshipMECD
dc.description.statuspub
dc.eprint.idhttps://eprints.ucm.es/id/eprint/24415
dc.identifier.doi10.1088/0957-4484/14/1/315
dc.identifier.issn0957-4484
dc.identifier.officialurlhttp://iopscience.iop.org/0957-4484/14/1/315
dc.identifier.relatedurlhttp://iopscience.iop.org
dc.identifier.urihttps://hdl.handle.net/20.500.14352/50969
dc.issue.number1
dc.journal.titleNanotechnology
dc.language.isoeng
dc.page.final68
dc.page.initial65
dc.publisherIop Publishing Ltd
dc.relation.projectIDMAT 2000-2119
dc.relation.projectIDSB 2000-0164
dc.rights.accessRightsopen access
dc.subject.cdu538.9
dc.subject.keywordLuminescence Properties
dc.subject.keywordTunneling-Microscopy
dc.subject.keywordPorous Silicon
dc.subject.keywordStates
dc.subject.ucmFísica de materiales
dc.titleElectrical characterization of nanocrystalline Si films by scanning tunnelling spectroscopy and beam-induced current in the scanning tunnelling microscope
dc.typejournal article
dc.volume.number14
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dspace.entity.typePublication
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