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Thomas-fermi approach to resonant-tunneling in delta-doped diodes

dc.contributor.authorDíez Alcántara, Eduardo
dc.contributor.authorDomínguez-Adame Acosta, Francisco
dc.contributor.authorSánchez, Angel
dc.date.accessioned2023-06-20T19:11:45Z
dc.date.available2023-06-20T19:11:45Z
dc.date.issued1995-05-01
dc.description© 1995 American- Institute of Physics. F. D.-A. acknowledges support from UCM through project PR161/93-4811. A. S. acknowledges partial support from C.I.C. y T. (Spain) through project PB92-0248 and by the European Union Human Capital and Mobility Programme through contract ERBCHRXCT930413.
dc.description.abstractWe study resonant tunneling in B-S-doped diodes grown by Si-molecular beam epitaxy. A Thomas-Fermi approach is used to obtain the conduction-band modulation. Using a scalar Hamiltonian within the effective-mass approximation. we demonstrate that the occurrence of negative differential resistance (NDR) only involves conduction-band states, whereas interband tunneling effects seem to be negligible. Our theoretical results are in very good agreement with recent experimental observations of NDR in this type of diode. 0 1995 American Institute of Physics.
dc.description.departmentDepto. de Física de Materiales
dc.description.facultyFac. de Ciencias Físicas
dc.description.refereedTRUE
dc.description.sponsorshipUCM
dc.description.sponsorshipC.I.C. y T. (Spain)
dc.description.sponsorshipEuropean Union Human Capital and Mobility Programme
dc.description.statuspub
dc.eprint.idhttps://eprints.ucm.es/id/eprint/27712
dc.identifier.doi10.1063/1.359404
dc.identifier.issn0021-8979
dc.identifier.officialurlhttp://dx.doi.org/10.1063/1.359404
dc.identifier.relatedurlhttp://scitation.aip.org
dc.identifier.urihttps://hdl.handle.net/20.500.14352/59376
dc.issue.number9
dc.journal.titleJournal of Applied Physics
dc.language.isoeng
dc.page.final4819
dc.page.initial4816
dc.publisherAmerican Institute of Physics
dc.relation.projectID(PR161/93-4811)
dc.relation.projectID(PB92-0248)
dc.relation.projectID(ERBCHRXCT930413)
dc.rights.accessRightsopen access
dc.subject.cdu538.9
dc.subject.keywordPhysics
dc.subject.keywordApplied
dc.subject.ucmFísica de materiales
dc.titleThomas-fermi approach to resonant-tunneling in delta-doped diodes
dc.typejournal article
dc.volume.number77
dcterms.references1. J. Wang, Y. Wang, and H. Guo, J. Appl. Phys. 75, 2724 (1994). 2. M. R. Sardela, H. H. Radamson, and G. V. Hansson, Appl. Phys. Lett. 64, 1711 (1994). 3. G. Bastard, Wave Mechanics Applied to Semiconductor Heterostructures (Les Editions de Physique, Paris, ,1988). 4. L. Ioratti, Phys. Rev. B 41, 8340 (1990). 5. J. C. Egues, J. C. Barbosa, A. C. Notari, P Basmaji, and L. Ioratti, J. Appl. Phys. 70, 3678 (1991). 6. Domínguez-Adame, B. Méndez, and E. Mac&, Semicond. Sci. Technol. 9, 263 (1994). 7. E Domínguez-Adame and B. Méndez, Phys. Rev. B 49, 11471 (1994). 8. M. Jaros, Physics ai2d Applications of Semiconductor Microstncctures (Clarendon, Oxford, 1989). 9. L. M. R. Scolfaro, D. Beliaev, R. Enderlein, and J. R. Leite, Phys. Rev. B 50, 8699 (1994). 10. H. H. Radamson, M. R. Sardela, 0. Nur, M. Wdlander, B. E. Semelius, W.-X. Ni, and G. V. Hansson, Appl. Phys. Lett. 64, 1482 (1994). 11. F. Capasso and R A. Kiehl, J. Appl. Phys. 58, 1366 (1985). 12. S. M. Booker, E W. Sheard, and G. A. Toombs, Semicond. Sci. Technol. B 7, 439 (1992).
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