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Study of growth hillocks in GaN : Si films by electron beam induced current imaging

dc.contributor.authorZaldivar, M.H.
dc.contributor.authorFernández Sánchez, Paloma
dc.contributor.authorPiqueras De Noriega, Francisco Javier
dc.date.accessioned2023-06-20T19:01:24Z
dc.date.available2023-06-20T19:01:24Z
dc.date.issued2001-07-15
dc.description© 2001 American Institute of Physics. This work was supported by MCYT-DGI (Project No. MAT2000-2119). M.H.Z. thanks AECI and CoNaCyT for a research grant.
dc.description.abstractRemote electron beam induced current (REBIC) measurements have been carried out to investigate electrically active regions in Si doped GaN films. REBIC bright-dark contrast has been observed in the border of growth, round or pyramidal, hillocks, while pyramidal hillocks also show bright contrast at the center. The results are explained by the inhomogeneous distribution of charged point defects and impurities at the hillocks.
dc.description.departmentDepto. de Física de Materiales
dc.description.facultyFac. de Ciencias Físicas
dc.description.refereedTRUE
dc.description.sponsorshipMCYT-DGI
dc.description.sponsorshipAECI
dc.description.sponsorshipCoNaCyT
dc.description.statuspub
dc.eprint.idhttps://eprints.ucm.es/id/eprint/26298
dc.identifier.doi10.1063/1.1379773
dc.identifier.issn0021-8979
dc.identifier.officialurlhttp://dx.doi.org/10.1063/1.1379773
dc.identifier.relatedurlhttp://dx.doi.org
dc.identifier.urihttps://hdl.handle.net/20.500.14352/59122
dc.issue.number2
dc.journal.titleJournal of Applied Physics
dc.language.isoeng
dc.page.final1060
dc.page.initial1058
dc.publisherAmerican Institute of Physics
dc.relation.projectIDMAT2000-2119
dc.rights.accessRightsopen access
dc.subject.cdu538.9
dc.subject.keywordGrain-Boundaries
dc.subject.ucmFísica de materiales
dc.titleStudy of growth hillocks in GaN : Si films by electron beam induced current imaging
dc.typejournal article
dc.volume.number90
dcterms.references1. P. G. Middleton, C. Trager-Cowan, A. Mohammed, K. P. O’Donnell, W. Van Der Stricht, I. Moerman, and P. Demeester, Mater. Res. Soc. Symp. Proc. 449, 417 (1997). 2. M. Herrera Zaldivar, P. Ferna´ndez, and J. Piqueras, J. Appl. Phys. 83, 462 (1998). 3. D. B. Holt, in SEM Microcharacterization of Semiconductors, edited by D. B. Holt and D. C. Joy (Academic, New York, 1989), pp. 241–338. 4. L. O. Bubulac and W. E. Tennant, Appl. Phys. Lett. 52, 1255 (1988). 5. G. Panin and E. Yakimov, Semicond. Sci. Technol. 7, A150 (1992). 6. D. B. Holt, B. Raza, and A. Wojcik, Mater. Sci. Eng., B 42, 14 (1996). 7. C. Díaz-Guerra and J. Piqueras, Appl. Phys. Lett. 71, 2830 (1997). 8. A. Cremades and J. Piqueras, J. Appl. Phys. 85, 1438 (1999). 9. E. Ziegler, W. Siegel, H. Blumtritt, and O. Breitenstein, Phys. Status Solidi B 72, 593 (1982). 10. G. J. Russell, M. J. Robertson, B. Vincent, and J. Woods, J. Mater. Sci. 15, 939 (1980). 11. G. N. Panin and E. B. Yakimov, Inst. Phys. Conf. Ser. 117, 763 (1991). 12. F. A. Ponce, J. W. Steeds, C. D. Dyer, and G. D. Pitt, Appl. Phys. Lett. 69, 2650 (1996).
dspace.entity.typePublication
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relation.isAuthorOfPublication.latestForDiscoverydaf4b879-c4a8-4121-aaff-e6ba47195545

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