Study of growth hillocks in GaN : Si films by electron beam induced current imaging
dc.contributor.author | Zaldivar, M.H. | |
dc.contributor.author | Fernández Sánchez, Paloma | |
dc.contributor.author | Piqueras De Noriega, Francisco Javier | |
dc.date.accessioned | 2023-06-20T19:01:24Z | |
dc.date.available | 2023-06-20T19:01:24Z | |
dc.date.issued | 2001-07-15 | |
dc.description | © 2001 American Institute of Physics. This work was supported by MCYT-DGI (Project No. MAT2000-2119). M.H.Z. thanks AECI and CoNaCyT for a research grant. | |
dc.description.abstract | Remote electron beam induced current (REBIC) measurements have been carried out to investigate electrically active regions in Si doped GaN films. REBIC bright-dark contrast has been observed in the border of growth, round or pyramidal, hillocks, while pyramidal hillocks also show bright contrast at the center. The results are explained by the inhomogeneous distribution of charged point defects and impurities at the hillocks. | |
dc.description.department | Depto. de Física de Materiales | |
dc.description.faculty | Fac. de Ciencias Físicas | |
dc.description.refereed | TRUE | |
dc.description.sponsorship | MCYT-DGI | |
dc.description.sponsorship | AECI | |
dc.description.sponsorship | CoNaCyT | |
dc.description.status | pub | |
dc.eprint.id | https://eprints.ucm.es/id/eprint/26298 | |
dc.identifier.doi | 10.1063/1.1379773 | |
dc.identifier.issn | 0021-8979 | |
dc.identifier.officialurl | http://dx.doi.org/10.1063/1.1379773 | |
dc.identifier.relatedurl | http://dx.doi.org | |
dc.identifier.uri | https://hdl.handle.net/20.500.14352/59122 | |
dc.issue.number | 2 | |
dc.journal.title | Journal of Applied Physics | |
dc.language.iso | eng | |
dc.page.final | 1060 | |
dc.page.initial | 1058 | |
dc.publisher | American Institute of Physics | |
dc.relation.projectID | MAT2000-2119 | |
dc.rights.accessRights | open access | |
dc.subject.cdu | 538.9 | |
dc.subject.keyword | Grain-Boundaries | |
dc.subject.ucm | Física de materiales | |
dc.title | Study of growth hillocks in GaN : Si films by electron beam induced current imaging | |
dc.type | journal article | |
dc.volume.number | 90 | |
dcterms.references | 1. P. G. Middleton, C. Trager-Cowan, A. Mohammed, K. P. O’Donnell, W. Van Der Stricht, I. Moerman, and P. Demeester, Mater. Res. Soc. Symp. Proc. 449, 417 (1997). 2. M. Herrera Zaldivar, P. Ferna´ndez, and J. Piqueras, J. Appl. Phys. 83, 462 (1998). 3. D. B. Holt, in SEM Microcharacterization of Semiconductors, edited by D. B. Holt and D. C. Joy (Academic, New York, 1989), pp. 241–338. 4. L. O. Bubulac and W. E. Tennant, Appl. Phys. Lett. 52, 1255 (1988). 5. G. Panin and E. Yakimov, Semicond. Sci. Technol. 7, A150 (1992). 6. D. B. Holt, B. Raza, and A. Wojcik, Mater. Sci. Eng., B 42, 14 (1996). 7. C. Díaz-Guerra and J. Piqueras, Appl. Phys. Lett. 71, 2830 (1997). 8. A. Cremades and J. Piqueras, J. Appl. Phys. 85, 1438 (1999). 9. E. Ziegler, W. Siegel, H. Blumtritt, and O. Breitenstein, Phys. Status Solidi B 72, 593 (1982). 10. G. J. Russell, M. J. Robertson, B. Vincent, and J. Woods, J. Mater. Sci. 15, 939 (1980). 11. G. N. Panin and E. B. Yakimov, Inst. Phys. Conf. Ser. 117, 763 (1991). 12. F. A. Ponce, J. W. Steeds, C. D. Dyer, and G. D. Pitt, Appl. Phys. Lett. 69, 2650 (1996). | |
dspace.entity.type | Publication | |
relation.isAuthorOfPublication | daf4b879-c4a8-4121-aaff-e6ba47195545 | |
relation.isAuthorOfPublication | 68dabfe9-5aec-4207-bf8a-0851f2e37e2c | |
relation.isAuthorOfPublication.latestForDiscovery | daf4b879-c4a8-4121-aaff-e6ba47195545 |
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