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Micro-Raman study of surface alterations in InGaAs after thermal annealing treatments

dc.contributor.authorMartil De La Plaza, Ignacio
dc.contributor.authorGonzález Díaz, Germán
dc.date.accessioned2023-06-20T19:00:33Z
dc.date.available2023-06-20T19:00:33Z
dc.date.issued2002-11-20
dc.descriptionIUMRS International Conference on Electronic Materials (IUMRS-ICEM2002) (8. 2002. Xian-Peoples, China). © World Scientific Publishing Company. This work was partially by DGICYT grant PB97-1254 and by CICYT grant TIC-98/0740. One of us (S.H.) acknowledges support from Departament d'Universitats i Recerca de la Generalitat de Catalunya.
dc.description.abstractWe present a micro-Raman study of alterations in InGaAs/InP epilayers after rapid thermal annealing. Defects consisting of protruding material with typical dimensions of a few microns can be observed on the surface of the annealed samples. Micro-Raman measurements on these defects show that they consist of InxGa1-xP alloys, suggesting that phosphorus diffusion from the InP substrate occurs during the RTA cycle. The defect-free region of the epilayer is also altered leading to the formation of an In1-xGaxAs1-yPy quaternary alloy.
dc.description.departmentDepto. de Estructura de la Materia, Física Térmica y Electrónica
dc.description.facultyFac. de Ciencias Físicas
dc.description.refereedTRUE
dc.description.sponsorshipDGICYT
dc.description.sponsorshipCICYT
dc.description.statuspub
dc.eprint.idhttps://eprints.ucm.es/id/eprint/26171
dc.identifier.doi10.1142/S0217979202015492
dc.identifier.issn0217-9792
dc.identifier.officialurlhttp://dx.doi.org/10.1142/S0217979202015492
dc.identifier.relatedurlhttp://www.worldscientific.com
dc.identifier.urihttps://hdl.handle.net/20.500.14352/59097
dc.issue.number28-29
dc.journal.titleInternational Journal of Modern Physics B
dc.language.isoeng
dc.page.final4404
dc.page.initial4401
dc.publisherWorld Scientific Publ. Co. Pte.Ltd.
dc.relation.projectIDPB97-1254
dc.relation.projectIDTIC-98/0740
dc.rights.accessRightsopen access
dc.subject.cdu537
dc.subject.keywordScattering
dc.subject.keywordIn(1-x)GaxAsyP(1-y)
dc.subject.keywordInP.
dc.subject.ucmElectricidad
dc.subject.ucmElectrónica (Física)
dc.subject.unesco2202.03 Electricidad
dc.titleMicro-Raman study of surface alterations in InGaAs after thermal annealing treatments
dc.typejournal article
dc.volume.number16
dcterms.references1) S. Koumetx, J. Marcon, K. Ketata, C. Dubon-Chevalier, P.Launay, J.L. Benchimol, Appl. Phys. Lett., 67, 2161-2163 (1995). 2) R. Berserman, C. Hirlimann, M. Balkanski, J. Chevallier, Solid State Commun., 20, 485-487 (1976). 3) L. Artús, R. Cuscó, J. Ibáñez, N. Blanco, G. González-Díaz, Phys. Rev. B., 60, 5456-5463 (1999). 4) B. Jusserand, S. Slempkes, Solid State Commun., 49, 95-98 (1984). 5) J.P. Estrera, P.D. Stevens, R. Glosser, W.M. Duncan, Y.C. Kao, H.Y. Liu, E.A. Beam III, Appl. Phys. Lett., 61, 1927-1929 (1992). 6) R. Cuscó, G. Talamás, L. Artús, J.M. Martín, G. González-Díaz, J. Appl. Phys., 79, 3927-3929 (1996). 7) A. Pinczuk, J.M. Worlock, R.E. Nahory, M.A. Pollack, Appl. Phys. Lett., 33, 461-463 (1978).
dspace.entity.typePublication
relation.isAuthorOfPublication6db57595-2258-46f1-9cff-ed8287511c84
relation.isAuthorOfPublicationa5ab602d-705f-4080-b4eb-53772168a203
relation.isAuthorOfPublication.latestForDiscoverya5ab602d-705f-4080-b4eb-53772168a203

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