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Lifetime recovery in ultrahighly titanium-doped silicon for the implementation of an intermediate band material

dc.contributor.authorMartil De La Plaza, Ignacio
dc.contributor.authorGonzález Díaz, Germán
dc.contributor.authorOlea Ariza, Javier
dc.date.accessioned2023-06-20T03:41:17Z
dc.date.available2023-06-20T03:41:17Z
dc.date.issued2009-01-26
dc.description© 2009 American Institute of Physics. This work has been supported by the project FULL SPECTRUM (Grant No. SES6-CT-2003-502620) funded by the European Commission, by the Regional Government of Madrid within the project NUMANCIA (Grant No. S-0505/ENE/000310), and by the Spanish National Research Program within the project GENESIS-FV (Grant No. CSD2006-0004).
dc.description.abstractThe doping of conventional semiconductors with deep level (DL) centers has been proposed to synthesize intermediate band materials. A recent fundamental study of the nonradiative recombination (NRR) mechanisms predicts the suppression of the NRR for ultrahigh DL dilutions as a result of the delocalization of the impurity electron wave functions. Carrier lifetime measurements on Si wafers doped with Ti in the 10(20)-10(21) cm(-3) concentration range show an increase in the lifetime, in agreement with the NRR suppression predicted and contrary to the classic understanding of DL action.
dc.description.departmentDepto. de Estructura de la Materia, Física Térmica y Electrónica
dc.description.facultyFac. de Ciencias Físicas
dc.description.refereedTRUE
dc.description.sponsorshipFULL SPECTRUM funded by the European Commission
dc.description.sponsorshipRegional Government of Madrid
dc.description.sponsorshipSpanish National Research Program
dc.description.statuspub
dc.eprint.idhttps://eprints.ucm.es/id/eprint/25910
dc.identifier.doi10.1063/1.3077202
dc.identifier.issn0003-6951
dc.identifier.officialurlhttp://dx.doi.org/10.1063/1.3077202
dc.identifier.relatedurlhttp://scitation.aip.org
dc.identifier.urihttps://hdl.handle.net/20.500.14352/44248
dc.issue.number4
dc.journal.titleApplied physics Letters
dc.language.isoeng
dc.publisherAmer Inst Physics
dc.relation.projectIDSES6-CT-2003-502620
dc.relation.projectIDPproject NUMANCIA-(S-0505/ENE/000310)
dc.relation.projectIDProject GENESIS-FV-CSD2006-0004
dc.rights.accessRightsopen access
dc.subject.cdu537
dc.subject.keywordSolar-Cells
dc.subject.keywordRecombination
dc.subject.keywordDiffusion.
dc.subject.ucmElectricidad
dc.subject.ucmElectrónica (Física)
dc.subject.unesco2202.03 Electricidad
dc.titleLifetime recovery in ultrahighly titanium-doped silicon for the implementation of an intermediate band material
dc.typejournal article
dc.volume.number94
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relation.isAuthorOfPublication.latestForDiscoverya5ab602d-705f-4080-b4eb-53772168a203

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