Spatial-distribution of defects in GaAs: Te wafers studied by cathodoluminescence
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1988
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Amer Inst Physics
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Abstract
Cathodoluminiscence (CL) scanning electron microscopy and positron annihilation techniques have been used to investigate the distribution of defects in GaAs: Te wafers. Dislocation density and near-band-edge CL profiles along the wafer have different shapes. positron lifetime measurements do not show spatial changes of vacancy concentration in the wafers, but a higer vacancy concentration has been detected in the Te-doped samples relative to SI samples. Results are discussed in terms of vacancies and impurity vacancy complexes.
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© 1988 Amer Inst Physics.
The authors thank Wacker-Chemitronic (Dr K. Löhnert) for providing the samples. The help of Dr. J. Llopis during this work is acknowledged. This work was partially supported by Comisión Interministerial de Ciencia y Tecnología (Project No. PB86-0151).