Intermediate band mobility in heavily titanium-doped silicon layers
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2009
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Elsevier Science BV
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Abstract
The sheet resistance and the Hall mobility of high-purity Si wafers, in whose surface Ti atoms are implanted and laser annealed reaching concentrations above 10(21) cm(-3), are measured in the 90-370 K range. Below 240 K, an unconventional behavior is observed that is well explained on the basis of the appearance of ail intermediate band (IB) region able to form a blocking junction with the substrate and of the appearance of an IB conduction. Explanations based on ordinary device physics fail to justify all the unconventional behavior of the characteristics observed.
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© 2009 Elsevier B.V. All rights reserved. This work has been supported by the project IBPOWER, funded by the European Commission under Contract no .211640, by the Regional Government of Madrid with in the project NUMANCIA (S-0505/ENE/000310) and by the Spanish National Research Program with in the project GENESIS-FV (CSD2006-0004).